Published July 1980
| Version v1
Report
Heavy ion lithography
Creators
- 1. Gesellschaft fuer Schwerionenforschung m.b.H., Darmstadt (Germany, F.R.)
Description
no abstract available
Additional details
Publishing Information
- Imprint Title
- Scientific report 1979
- Imprint Pagination
- 302 p.
- Journal Page Range
- p. 155.
- Report number
- GSI--80-3
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 12597525
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- ARGON IONS; IMAGES; ION IMPLANTATION; KEV RANGE 100-1000; LATENT IMAGES; PHYSICAL RADIATION EFFECTS; RADIATION DOSES; SILICON; SPATIAL RESOLUTION
- Descriptors DEC
- CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; IONS; KEV RANGE; RADIATION EFFECTS; RESOLUTION; SEMIMETALS
Optional Information
- Notes
- Published in summary form only.