Soft X-ray emission analysis of a pulsed capillary discharge operated in nitrogen
- 1. Facultad de Física, Pontificia Universidad Católica de Chile, Ave. Vicuña Mackenna 4860, Santiago (Chile)
Description
We present results from a pulsed capillary ns discharge source, operated in Nitrogen and N/He mixtures, in an alumina capillary 2.1 mm long with outer diameter of 6.3 mm and inner diameter of 1.6 mm. The electrical energy stored is 0.5 J with peak current of 6 kA. Fast charging from an IGBT based pulsed power circuit allows operation at 35-600 Hz with voltages in the range of 18-24 kV. Characteristic time-integrated N/He spectra were recorded and analyzed for values of 20-200 Å, with clear evidence of He-like Nitrogen emission at 28.8Å, which represents a possible source for water window soft x-ray microscopy. Filtered diode measurements reveal the influence of axial electron beams, generated by hollow cathode dynamics, on the x-ray emission in the range of 300-450 eV. We discuss optimal voltage applied and pressure conditions for soft x-ray generation. Time-integrated MCP images of a filtered slit-wire system delivered clear evidence of full wall detachment with ∼500 μm in radial size for the entire emission range and ∼200μm for the emission in the 300-450 eV range.
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/511/1/012022Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 511
- Journal Issue
- 1
- Journal Page Range
- [4 p.]
- ISSN
- 1742-6596
Conference
- Title
- 15. international congress on plasma physics; LAWPP2010: 13. Latin American workshop on plasma physics
- Acronym
- ICPP2010
- Dates
- 8-13 Aug 2010
- Place
- Santiago (Chile)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46083552
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM OXIDES; BINARY MIXTURES; CURRENTS; ELECTRIC DISCHARGES; ELECTRON BEAMS; EMISSION; FILTERS; HELIUM; HOLLOW CATHODES; IMAGES; MICROSCOPY; NITROGEN; SOFT X RADIATION; SPECTRA; WATER; WINDOWS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; BEAMS; CATHODES; CHALCOGENIDES; DISPERSIONS; ELECTRODES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; HYDROGEN COMPOUNDS; IONIZING RADIATIONS; LEPTON BEAMS; MIXTURES; NONMETALS; OPENINGS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; RADIATIONS; RARE GASES; X RADIATION