Published March 1999 | Version v1
Journal article

Elements of doping engineering in semiconductors

  • 1. National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

Description

Using defect thermodynamics, we discuss physical factors that affect doping limits in semiconductors. The dependencies of the defect formation enthalpy on the atomic chemical potentials and on the electron Fermi energy are demonstrated. These dependencies, in particular on the Fermi energy, lead to spontaneous formation of charge-compensating defects that can limit doping. Experimental data compiled for III-V, II-VI, and I-III-VI2 compounds support this view and further provide insight into the connections among different host materials. We argue that what matters is not the magnitude of the band gap that determines the dopability of a material, but rather, the relative position of the conduction-band minimum (in the case of n-doping) and the valence-band maximum (in the case of p-doping) with respect to vacuum. copyright 1999 American Institute of Physics

Additional details

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
462
Journal Issue
1
Journal Page Range
p. 62-69
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
15. National Center for Photovoltaics program review conference
Dates
9-11 Sep 1998
Place
Denver, CO (United States)

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
30046210
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CRYSTAL DEFECTS; CRYSTAL DOPING; ELECTRONIC STRUCTURE; FERMI LEVEL; SEMICONDUCTOR MATERIALS; THERMODYNAMIC PROPERTIES
Descriptors DEC
CRYSTAL STRUCTURE; ENERGY LEVELS; MATERIALS; PHYSICAL PROPERTIES

Optional Information

Secondary number(s)
CONF-980935--