Elements of doping engineering in semiconductors
Creators
- 1. National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)
Description
Using defect thermodynamics, we discuss physical factors that affect doping limits in semiconductors. The dependencies of the defect formation enthalpy on the atomic chemical potentials and on the electron Fermi energy are demonstrated. These dependencies, in particular on the Fermi energy, lead to spontaneous formation of charge-compensating defects that can limit doping. Experimental data compiled for III-V, II-VI, and I-III-VI2 compounds support this view and further provide insight into the connections among different host materials. We argue that what matters is not the magnitude of the band gap that determines the dopability of a material, but rather, the relative position of the conduction-band minimum (in the case of n-doping) and the valence-band maximum (in the case of p-doping) with respect to vacuum. copyright 1999 American Institute of Physics
Additional details
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 462
- Journal Issue
- 1
- Journal Page Range
- p. 62-69
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 15. National Center for Photovoltaics program review conference
- Dates
- 9-11 Sep 1998
- Place
- Denver, CO (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 30046210
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CRYSTAL DEFECTS; CRYSTAL DOPING; ELECTRONIC STRUCTURE; FERMI LEVEL; SEMICONDUCTOR MATERIALS; THERMODYNAMIC PROPERTIES
- Descriptors DEC
- CRYSTAL STRUCTURE; ENERGY LEVELS; MATERIALS; PHYSICAL PROPERTIES
Optional Information
- Secondary number(s)
- CONF-980935--