Determination of the deformation state of HgSe / ZnTe layers
Creators
- 1. Berlin, Humboldt Univ. (Germany). Institut fuer Physik
- 2. Paderborn, Universitat-Gesamthochschule (Germany). Fachbereich Physik
Description
High-resolution X-ray diffraction is commonly used to measure the misfit strain and to determine the unstrained lattice parameter of epitaxial semiconductor layers assuming tetragonal distortion. A method is developed which links the measured inter-planar spacings to the deformation tensor without assumption of layer symmetry. For the system HgSe on a thick ZnTe buffer layer deposited by MBE on GaAs substrate, the six components of the reciprocal metric tensor of each layer are determined by a least-squares algorithm from a set of reciprocal lattice vectors (137, 553). A principal-axis transformation of the calculated deformation tensor shows that the deformation nearly parallel to the [110[ and [110[ directions in the interface plane differs by more than 15 %. This difference is a function of the epilayer thickness and reaches a maximum for layers slightly thicker than the critical thickness
Additional details
Publishing Information
- Journal Title
- Nuovo Cimento. D
- Journal Volume
- 19D
- Journal Issue
- 2-4
- Journal Page Range
- p. 339-346.
- ISSN
- 0392-6737
- CODEN
- NCSDDN
INIS
- Country of Publication
- Italy
- Country of Input or Organization
- Italy
- INIS RN
- 29011905
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CRYSTAL DEFECTS; DEFORMATION; EPITAXY; LAYERS; SCATTERING; SELENIUM COMPOUNDS; SEMICONDUCTOR MATERIALS; X-RAY DIFFRACTION; ZINC TELLURIDES
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; CRYSTAL STRUCTURE; DIFFRACTION; MATERIALS; TELLURIDES; TELLURIUM COMPOUNDS; ZINC COMPOUNDS