A multilayer innovative solution to improve the adhesion of nanocrystalline diamond coatings
- 1. Univ. Bordeaux, ICMCB, UPR 9048, F-33600 Pessac (France)
- 2. CNRS, ICMCB, UPR 9048, F-33600 Pessac (France)
Description
Highlights: • Improvement of the NCD adhesion on WC-12%Co substrates for tooling applications using a multi-interlayer additional system. • Reduction of the graphite layer thickness and continuity at the interface with the diamond. • Transmission electron microscopy study for a better understanding of the diffusion phenomena occurring at the interfaces. - Abstract: Nano-crystalline diamond (NCD) films grown under negative biased substrates by chemical vapor deposition (CVD) are widely used as surface overlay coating onto cermet WC-Co cutting tools to get better performances. To improve the diamond adhesion to the cermet substrate, suitable multi-layer systems have been added. They are composed of a cobalt diffusion barrier close to the substrate (single and sequenced nitrides layers) coated with a nucleation extra layer to improve the nucleus density of diamond during CVD processing. For all systems, before and after diamond deposition, transmission electron microscopy (TEM) has been performed for a better understanding of the diffusion phenomena occurring at the interfaces and to evaluate the presence of graphitic species at the interface with the diamond. Innovative multilayer system dedicated to the regulation of cobalt diffusion coated with a bilayer system optimized for the carbon diffusion control, is shown as an efficient solution to significantly reduce the graphite layer formation at the interface with the diamond down to 10 nm thick and to increase the adhesion of NCD diamond layer as scratch-tests confirm
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2015.01.050Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2015.01.050;
- PII
- S0169-4332(15)00062-8;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 331
- Journal Page Range
- p. 27-34
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47033997
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADHESION; CHEMICAL VAPOR DEPOSITION; COATINGS; COBALT; CRYSTALS; DIAMONDS; DIFFUSION BARRIERS; FILMS; GRAPHITE; INTERFACES; LAYERS; NANOSTRUCTURES; NITRIDES; REDUCTION; SUBSTRATES; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN CARBIDES
- Descriptors DEC
- CARBIDES; CARBON; CARBON COMPOUNDS; CHEMICAL COATING; CHEMICAL REACTIONS; DEPOSITION; DIMENSIONS; ELECTRON MICROSCOPY; ELEMENTS; METALS; MICROSCOPY; MINERALS; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; REFRACTORY METAL COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.