Published June 1997 | Version v1
Journal article

Formation of carrier generation centers in pure Si upon interaction with fast ions

  • 1. A.F. Ioffe Physicotechnical Institute, Russian Academy of Sciences, 194021 St. Petersburg (Russian Federation)

Description

The radiation defects in p+-n-n+ structures based on pure n-type Si irradiated by α particles and fission fragments from natural-decay sources are studied by deep-level transient spectroscopy (DLTS). The nature of the components of the reverse current in the structures caused by carrier generation via deep levels is investigated. The systems of deep centers for light and heavy ions are found to be identical. A correlation between the generation component of the current and the concentration of the Eν+0.33 eV centers bound to interstitial carbon is observed after a low-temperature anneal. In the case of heavy ions the DLTS spectra do not have the expected peak positions and shapes associated with the pileup of local defects. An estimate of the generation rate in a model of local p-n junctions shows that clusters of defects create a significantly smaller current than does an equivalent number of defects with deep levels located in the n-type host of the structure

Additional details

Publishing Information

Journal Title
Semiconductors
Journal Volume
31
Journal Issue
6
Journal Page Range
p. 575-579
ISSN
1063-7826
CODEN
SMICES

Optional Information

Notes
Translated from Fizika i Tekhnika Poluprovodnikov, ISSN 0015-3222, 31, 674-679 (June 1997); (c) 1997 American Institute of Physics.