Published 2010
| Version v1
Miscellaneous
X-Ray Topographic Investigation of Precipitates in HT - HP Treated Si:N
Creators
- 1. Institute of Electron Technology, Warsaw (Poland)
- 2. Institute of Electronic Materials Technology, Warsaw (Poland)
- 3. Institute of Atomic Energy POLATOM, Otwock-Swierk (Poland)
- 4. University of Athens, Athens (Greece)
- 5. Institute of Physics, PAS, Warsaw (Poland)
- 6. State Key Laboratory of Silicon Materials, Hangzhou (China)
- 7. HASYLAB at DESY, Hamburg (Germany)
Description
no abstract available
Additional details
Identifiers
Publishing Information
- Imprint Place
- Otwock-Swierk (Poland)
- Imprint Title
- Annual Report 2009
- Imprint Pagination
- 145 p.
- Journal Page Range
- p. 60
- ISSN
- 2081-6502
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 42023924
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract, Progress Report, Non-conventional Literature
- Descriptors DEI
- CRYSTAL DEFECTS; CZOCHRALSKI METHOD; DOPED MATERIALS; NITROGEN; PROGRESS REPORT; SAMPLE PREPARATION; SILICON; SYNCHROTRON RADIATION; X-RAY DIFFRACTION
- Descriptors DEC
- BREMSSTRAHLUNG; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; CRYSTAL STRUCTURE; DIFFRACTION; DOCUMENT TYPES; ELECTROMAGNETIC RADIATION; ELEMENTS; MATERIALS; NONMETALS; RADIATIONS; SCATTERING; SEMIMETALS
Optional Information
- Contract/Grant/Project number
- HASYLAB Project II-20060165 EC
- Notes
- 2 figs.; This record replaces 41128888