Mass spectroscopy of monoatomic chlorine layers on surface of solid-state substrates

The new methodology is proposed for determining the chlorine traces in the films, deposited on the solid-state (particularly silicon) substrates through the method of the secondary ion mass-spectroscopy, based on obtaining the molecular chlorine-containing positively charged ions. The solid-state sample secondary ionization was carried out by means of bombarding the chlorine-containing substrate through the methane molecular beam, which resulted in obtaining positively charge CCl2+ ions with the molecular mass of 82, 84 and 85. The above-mentioned mass-spectroscopic peaks are clearly observed in the form of the doublet and they are not shadowed by the substrate ions signals