Ion current distribution during deposition of dielectric material using an insulating porous alumina template

We have presented a numerical simulation of the deposition of dielectric material using an insulating porous template. A Maxwellian distribution has been used to calculate the original ion velocity when the ion leaves the plasma and enters the sheath. The microscopic electrical field over the template is considered to affect the ion motion. It is found that the electron temperature and nanopore structure can change the ion deposition rate effectively. However, the deposition rate decreases only slightly with the rise in plasma density and does not rely on the substrate bias obviously for the reason that the effect of electrical field near the template is limited. The result of our paper indicates that the templated i-PVD of dielectric nanodots is quite different from the templated i-PVD of metallic nanodots, and new ways should be tried for the plasma to fabricate dielectric nanodots using a porous template to make the effect from the electrical field and the substrate bias stronger