Negative ion source electrode
Description
The present invention concerns a negative ion source electrode which can be preferably used in a neutral particle injection device using negative ions for a thermonuclear reactor. Negative ion beams are deflected to the direction opposite to the deflecting direction by magnetic fields by using an electron suppression electrode having electrode holes with the position previously displaced before negative ion beams are accelerated to have a high energy by an accelerator thereby correcting the orbit of the negative ion beams easily. In addition, since the deflection correction electrode having the electrode holes is disposed, a proper voltage is applied to the deflection correction electrode to correct the orbit of the negative ion beams conveniently. Since the deflection correction electrode has a simple structure of a thin flat plate having electrode holes, the orbit of negative ion beams can be corrected efficiently by an extremely simple structure without inducing lowering of exhaustion performance, and peeling loss of negative ions caused by the lowering of the exhaustion performance compared with a negative ion source leading portion having a thick and complicated structure such as a thick electrode in which a permanent magnet for forming deflection correction magnetic fields is disposed. (N.H.)
Availability note (English)
Available from JAPIO. Also available from EPO.Additional details
Publishing Information
- Imprint Pagination
- 12 p.
- IPC:
- Int. Cl. H01J27/02; G21B1/00; H01J37/08; H05H1/22; H05H9/00.
- IPC
- Int. Cl. H01J27/02; G21B1/00; H01J37/08; H05H1/22; H05H9/00.
- Patent number
- JP patent document 9-17345/A/
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 28042526
- Subject category
- S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- ACCELERATORS; ANIONS; CORRECTIONS; ELECTRODES; ION BEAMS; ION SOURCES; MAGNETIC FIELDS; ORBITS; PERMANENT MAGNETS
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; EQUIPMENT; IONS; MAGNETS
Optional Information
- Secondary number(s)
- JP patent application 7-187901.