Published January 17, 1997 | Version v1
Patent

Negative ion source electrode

Description

The present invention concerns a negative ion source electrode which can be preferably used in a neutral particle injection device using negative ions for a thermonuclear reactor. Negative ion beams are deflected to the direction opposite to the deflecting direction by magnetic fields by using an electron suppression electrode having electrode holes with the position previously displaced before negative ion beams are accelerated to have a high energy by an accelerator thereby correcting the orbit of the negative ion beams easily. In addition, since the deflection correction electrode having the electrode holes is disposed, a proper voltage is applied to the deflection correction electrode to correct the orbit of the negative ion beams conveniently. Since the deflection correction electrode has a simple structure of a thin flat plate having electrode holes, the orbit of negative ion beams can be corrected efficiently by an extremely simple structure without inducing lowering of exhaustion performance, and peeling loss of negative ions caused by the lowering of the exhaustion performance compared with a negative ion source leading portion having a thick and complicated structure such as a thick electrode in which a permanent magnet for forming deflection correction magnetic fields is disposed. (N.H.)

Availability note (English)

Available from JAPIO. Also available from EPO.

Additional details

Publishing Information

Imprint Pagination
12 p.
IPC:
Int. Cl. H01J27/02; G21B1/00; H01J37/08; H05H1/22; H05H9/00.
IPC
Int. Cl. H01J27/02; G21B1/00; H01J37/08; H05H1/22; H05H9/00.
Patent number
JP patent document 9-17345/A/

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
28042526
Subject category
S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
ACCELERATORS; ANIONS; CORRECTIONS; ELECTRODES; ION BEAMS; ION SOURCES; MAGNETIC FIELDS; ORBITS; PERMANENT MAGNETS
Descriptors DEC
BEAMS; CHARGED PARTICLES; EQUIPMENT; IONS; MAGNETS

Optional Information

Secondary number(s)
JP patent application 7-187901.