Published December 15, 2013
| Version v1
Journal article
Highly wear-resistant ultra-thin per-fluorinated organic monolayers on silicon(1 1 1) surfaces
Creators
- 1. Laboratory of Organic Chemistry, Wageningen University, Dreijenplein 8, 6703 HB Wageningen (Netherlands)
- 2. Department of Chemical and Materials Engineering, King Abdulaziz University, Jeddah (Saudi Arabia)
Description
This study reports on fluorine-containing alkyne-derived monolayers onto Si(1 1 1) substrates to obtain densely packed, highly wear-resistant surfaces. The nano-wear properties were measured using atomic force microscopy (AFM). The presence of the fluorinated monolayers was found to enhance the wear properties of the silicon surfaces, with a decrease of the depth of wear scratches of up to 120 times as compared to the unmodified surface. Ultimately, the scratch depth was only 6 nm for a heptadecafluoro-alkyl based monolayer for scratching normal forces as high as 38 μN.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2013.09.106Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2013.09.106;
- PII
- S0169-4332(13)01747-9;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 287
- Journal Issue
- Complete
- Journal Page Range
- p. 159-164
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46004924
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; DENSITY; FLUORINATION; FLUORINE; ORGANIC COMPOUNDS; SILICON; SUBSTRATES; SURFACE COATING; SURFACES; THIN FILMS; WEAR RESISTANCE
- Descriptors DEC
- CHEMICAL REACTIONS; DEPOSITION; ELEMENTS; FILMS; HALOGENATION; HALOGENS; MECHANICAL PROPERTIES; MICROSCOPY; NONMETALS; PHYSICAL PROPERTIES; SEMIMETALS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.