Published August 18, 2010
| Version v1
Journal article
Photoanodic properties of pulsed-laser-deposited α-Fe2O3 electrode
- 1. Department of Chemistry, Graduate School of Science, Hokkaido University, Sapporo (Japan)
- 2. Photocatalytic Materials Center (PCMC), National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki (Japan)
Description
Iron oxide photoelectrodes were prepared using pulsed laser deposition with hematite pellet as the target. The dependences of photocurrent density on post-annealing O2 pressure, thickness, heating temperature and surface morphology were investigated in detail. The photoelectrode properties were characterized using Raman spectroscopy, XPS, UV-vis absorption spectroscopy, SEM, current density and photoelectrochemical measurements. The α-Fe2O3 thin film of thickness 70 nm prepared using the SiO2 sphere template method with post-annealing under an O2 pressure of 160 Pa at 550 0C showed the highest photocurrent density (275 μA cm-2) under AM1.5 solar simulated light irradiation.
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/43/32/325101Additional details
Identifiers
- DOI
- 10.1088/0022-3727/43/32/325101;
- PII
- S0022-3727(10)53944-5;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 43
- Journal Issue
- 32
- Journal Page Range
- [7 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42059630
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; ANNEALING; CURRENT DENSITY; ELECTRODES; ENERGY BEAM DEPOSITION; HEATING; HEMATITE; IRON OXIDES; IRON-ALPHA; LASER RADIATION; MORPHOLOGY; PULSED IRRADIATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON OXIDES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; HEAT TREATMENTS; IRON; IRON COMPOUNDS; IRON ORES; IRRADIATION; LASER SPECTROSCOPY; METALS; MICROSCOPY; MINERALS; ORES; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SILICON COMPOUNDS; SPECTROSCOPY; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS