Published 1996
| Version v1
Miscellaneous
The adsorption of oxygen on the HF-etched Si (111) surfaces: an XPS study
Creators
- 1. Polska Akademia Nauk, Warsaw (Poland). Inst. Fizyki
- 2. Polska Akademia Nauk, Warsaw (Poland). Inst. Chemii Fizycznej
Description
Short communication. 2 refs
Additional details
Additional titles
- Augmented title (English)
- Synchrotron application
Publishing Information
- Publisher
- Polish Synchrotron Radiation Society.
- Imprint Title
- Abstracts of 3. International School and Symposium on Synchrotron Radiation in Natural Science
- Imprint Pagination
- 104 p.
- Journal Page Range
- p. 47.
Conference
- Title
- 3. International School and Symposium on Synchrotron Radiation in Natural Science.
- Dates
- 31 May - 8 Jun 1996.
- Place
- Jaszowiec (Poland).
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 28070507
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference, No Abstract, Non-conventional Literature
- Descriptors DEI
- EMISSION SPECTROSCOPY; MEETINGS; OXYGEN; PHOTOEMISSION; SILICON; SORPTION; SURFACE TREATMENTS; SYNCHROTRON RADIATION
- Descriptors DEC
- BREMSSTRAHLUNG; ELECTROMAGNETIC RADIATION; ELEMENTS; EMISSION; NONMETALS; RADIATIONS; SECONDARY EMISSION; SEMIMETALS; SPECTROSCOPY