Radiation induced defects in 3C-SiC and their annealing behavior
- 1. Japan Atomic Energy Research Inst., Takasaki, Gunma (Japan). Takasaki Radiation Chemistry Research Establishment
Description
Electron spin resonance (ESR) was used to study radiation induced defects in CVD-grown 3C-SiC. Four new ESR-signals labeled T1, T5, T6, and T7 were found for the first time in 1MeV electron and 2MeV proton irradiated 3C-SiC epilayers. Analysis of ESR-line intensity and angular dependence of these signals by using spin Hamiltonian showed that the T1 and T5 signals arise from a negatively charged vacancy at a silicon sublattice site (spin state S=3/2, Td symmetry) and a positively charged vacancy at a carbon sublattice site (spin state S=1/2, D2 symmetry), respectively. It was also found that the T6 and T7 are attributable to vacancy-interstitial pairs (spin state S=1). Isochronal annealing of irradiated 3C-SiC epilayers indicated that the T1 center had three annealing stages of 150degC, 350degC, and 750degC, and that the T5, T6, and T7 centers were annealed at stages of 150degC, 300degC, and 300degC, respectively. (author)
Additional details
Publishing Information
- Journal Title
- Denshi Gijutsu Sogo Kenkyusho Iho
- Journal Volume
- 58
- Journal Issue
- 2
- Journal Page Range
- p. 125-132.
- ISSN
- 0366-9092
- CODEN
- DGSKAR
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 26024053
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; ELECTRON BEAMS; ELECTRON SPIN RESONANCE; HAMILTONIANS; INTERSTITIALS; PHYSICAL RADIATION EFFECTS; PROTON BEAMS; SEMICONDUCTOR MATERIALS; SILICON CARBIDES; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0400-1000 K; VACANCIES; VAPOR PHASE EPITAXY
- Descriptors DEC
- BEAMS; CARBIDES; CARBON COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL GROWTH METHODS; CRYSTAL STRUCTURE; EPITAXY; HEAT TREATMENTS; LEPTON BEAMS; MAGNETIC RESONANCE; MATERIALS; MATHEMATICAL OPERATORS; NUCLEON BEAMS; PARTICLE BEAMS; POINT DEFECTS; QUANTUM OPERATORS; RADIATION EFFECTS; RESONANCE; SILICON COMPOUNDS; TEMPERATURE RANGE