Versatile source for intense multiply-charged ion beams

Measurements of yield and charge state distribution of ions extracted from a DUOPIGATRON multiply-charged ion source are reported. Two different modes can be distinguished: the first one is characterized by low discharge voltage and high discharge current, the other one by low discharge current and high discharge voltage. With the first mode high shares of moderately charged ions are extracted and also the generation of multiply-charged ions of solids via sputtering is possible. The second discharge mode shows similar results to low-power PIG ion sources. Due to its versatility and comparatively long lifetime this ion source seems to be appropriate for many applications such as in heavy-ion accelerators, for ion implantation, and for surface investigation methods. (author)