Published 1990 | Version v1
Book

A GaAs-on-Si solar cell for space use

  • 1. NTT Aplied Electronics Lab., 3-9-11 Midori-cho, Musashino-shi, Tokyo 180 (Japan)

Description

This paper reports on efforts to growing high-quality GaAs films on Si substrates and improvements in the efficiency of GaAs-on-Si solar cells. The epitaxial growth of GaAs on Si was studied using MOCVD. The dislocation density in the active layer of the GaAs solar cell is significantly reduced by combining cyclic thermal annealing and the insertion of buffers such as InGaAs/GaAs and AlGaAs/GaAs. This minimal dislocation density allowed a large size and high conversion efficiency GaAs-on-Si solar cell to be fabricated with a total area of 2 cm square and an efficiency of 18.3% under AMO and one-sum illumination. After 1-MeV electron beam irradiation at 1 x 1015cm-2, the GaAs-on-Si cells show a normalized efficiency of 0.83, which is larger than the 0.71 of a GaAs-on-GaAs cell. The use of GaAs-on-Si solar cells as the power source for satellites now looks feasible because this material is highly efficient, lightweight, inexpensive, and highly radiation resistant

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
Twenty first IEEE photovoltaic specialists conference 1990 (Conference Record)
Imprint Pagination
1673 p.
Journal Page Range
p. 89-94.

Conference

Title
21. Institute for Electrical and Electronics Engineers (IEEE) photovoltaic specialists conference.
Dates
21-25 May 1990.
Place
Kissimmee, FL (USA).

Optional Information

Secondary number(s)
CONF-900542--.