Published 1989
| Version v1
Miscellaneous
Plasma diffusion in an inductively coupled RF plasma etching system
Creators
- 1. Australian National Univ., Canberra (Australia). Plasma Research Lab.
Description
Abstract only
Additional details
Publishing Information
- Publisher
- AINSE.
- Imprint Place
- Lucas Heights (Australia)
- Imprint Title
- 17th AINSE plasma physics conference: conference handbook
- Imprint Pagination
- 90 p.
- Journal Page Range
- p. 52.
- Report number
- INIS-mf--11537
Conference
- Title
- 17. AINSE plasma physics conference.
- Dates
- 6-8 Feb 1989.
- Place
- Lucas Heights (Australia).
INIS
- Country of Publication
- Australia
- Country of Input or Organization
- Australia
- INIS RN
- 20066901
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- ETCHING; MAGNETIC FIELDS; MEAN FREE PATH; PLASMA CONFINEMENT; PLASMA DENSITY; PLASMA PRESSURE; SOLENOIDS
- Descriptors DEC
- CONFINEMENT; ELECTRIC COILS; ELECTRICAL EQUIPMENT; EQUIPMENT