Published December 29, 2014 | Version v1
Journal article

Percolation conductivity in hafnium sub-oxides

  • 1. Novosibirsk State University, Novosibirsk 630090 (Russian Federation)
  • 2. Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk 630090 (Russian Federation)
  • 3. Department of Mechatronic Technology, National Taiwan Normal University, Taipei 106, Taiwan (China)
  • 4. National Chiao Tung University, Hsinchu 300, Taiwan (China)

Description

In this study, we demonstrated experimentally that formation of chains and islands of oxygen vacancies in hafnium sub-oxides (HfOx, x < 2) leads to percolation charge transport in such dielectrics. Basing on the model of Éfros-Shklovskii percolation theory, good quantitative agreement between the experimental and theoretical data of current-voltage characteristics was achieved. Based on the percolation theory suggested model shows that hafnium sub-oxides consist of mixtures of metallic Hf nanoscale clusters of 1–2 nm distributed onto non-stoichiometric HfOx. It was shown that reported approach might describe low resistance state current-voltage characteristics of resistive memory elements based on HfOx

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
105
Journal Issue
26
Journal Page Range
p. 262903-262903.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2014 AIP Publishing LLC