CO adsorption on Al-Zr at room temperature
Description
A study of CO adsorption on room temperature Al-Zr has been done using Auger electron spectroscopy and gas pressure measurements. The atomic surface composition of clean Al-Zr surfaces prepared in UHV by Ar+ sputtering, was measured as a function of CO pressure and exposure time. The adsorbed C and O have the same rate constants and surface concentrations for exposures less than 2 Langmuir. Above this exposure quasi-saturation occurs. The measured sticking probability of CO on Al-Zr is constant, S = 0.7 +- .3, for fractional coverage theta less than or equal to 0.5. Above this point S decreased rapidly. The effect of surface roughness on the apparent sticking coefficient has been calculated by a Monte-Carlo simulation. Reactivation of Al-Zr by heat treatment to 7000C has also been studied
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS., PC A02/MF A01.Files
12593692.pdf
Files
(321.0 kB)
| Name | Size | Download all |
|---|---|---|
|
md5:61affb2072deae9c928514dd8503f1b0
|
321.0 kB | Preview Download |
Additional details
Publishing Information
- Imprint Pagination
- 19 p.
- Report number
- PPPL--1721
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 12593692
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ADSORPTION; ALUMINIUM ALLOYS; AUGER ELECTRON SPECTROSCOPY; CARBON MONOXIDE; GETTERS; TFTR DEVICE; ZIRCONIUM ALLOYS
- Descriptors DEC
- ALLOYS; CARBON COMPOUNDS; CARBON OXIDES; CHALCOGENIDES; CLOSED PLASMA DEVICES; ELECTRON SPECTROSCOPY; OXIDES; OXYGEN COMPOUNDS; SPECTROSCOPY; THERMONUCLEAR DEVICES; TOKAMAK DEVICES; TRANSITION ELEMENT ALLOYS