Published March 2000
| Version v1
Journal article
Determination of lattice displacements in Se implanted InP by RBS and PIXE channeling experiments
Creators
Description
<1 0 0> InP single crystals were implanted with 600 keV Se at the critical temperature of 423 K with ion fluences ranging from 1013 to 1015 cm-2. The damaging of the In and P sublattices and the lattice location of the Se atoms have been studied by RBS and PIXE angular scan curves along the <1 0 0> and <1 1 0> directions. The critical angles and minimum yields have been extracted for each measurement. An attempt is made to determine the displacement distance of the constituent atoms from their lattice site
Additional details
Identifiers
- PII
- S0168583X9900779X;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 161-163
- Journal Issue
- 4
- Journal Page Range
- p. 515-519
- ISSN
- 0168-583X
- CODEN
- NIMBEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 33042992
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ATOMIC DISPLACEMENTS; BACKSCATTERING; INDIUM PHOSPHIDES; ION CHANNELING; ION IMPLANTATION; KEV RANGE; PIXE ANALYSIS; RUTHERFORD SCATTERING; SELENIUM IONS
- Descriptors DEC
- CHANNELING; CHARGED PARTICLES; CHEMICAL ANALYSIS; ELASTIC SCATTERING; ENERGY RANGE; INDIUM COMPOUNDS; IONS; NONDESTRUCTIVE ANALYSIS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PHYSICAL RADIATION EFFECTS; PNICTIDES; RADIATION EFFECTS; SCATTERING; X-RAY EMISSION ANALYSIS
Optional Information
- Copyright
- Copyright (c) 2000 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.