Optimized observation of tungsten tracers for investigation of formation of porous anodic alumina
Creators
- 1. Corrosion and Protection Centre, School of Materials, University of Manchester, P.O. Box 88, Manchester M60 1QD (United Kingdom)
- 2. Graduate School of Engineering, Hokkaido University, N13-W8, Sapporo 060-8628 (Japan)
Description
Improved methods are presented for investigating the flow of anodic alumina during the formation of porous anodic films on aluminium in phosphoric acid. In particular, the use of tungsten nanolayer tracers with increased flatness is shown to result in enhanced definition of the influences of flow on the tracer distribution, as observed by electron microscopy. Additionally, taper sectioning of films, by ultramicrotomy, and parallel sectioning of films, by sputtering using an Ar+ ion plasma, enable tungsten distributions across cells to be determined. In the case of an Al-3.5 at.%W alloy, the flow results in an inner alumina layer lining the pore walls that is relatively free of tungsten species and an outer cell layer of comparatively high tungsten content. Both sectioning procedures also show the presence of fine cell boundary bands of relatively high tungsten content, which are suggested to result from the transport of tungsten, enriched in the alloy immediately beneath the film, toward the cell boundary by the alloy/film interface.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2009.06.018Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2009.06.018;
- PII
- S0013-4686(09)00803-2;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 54
- Journal Issue
- 26
- Journal Page Range
- p. 6403-6411
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41044277
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM; ALUMINIUM ALLOYS; ALUMINIUM OXIDES; ANODIZATION; ARGON IONS; ELECTRON MICROSCOPY; FILMS; INTERFACES; LAYERS; PHOSPHORIC ACID; POROUS MATERIALS; SPUTTERING; TUNGSTEN; TUNGSTEN ALLOYS
- Descriptors DEC
- ALLOYS; ALUMINIUM COMPOUNDS; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL COATING; CORROSION PROTECTION; DEPOSITION; ELECTROCHEMICAL COATING; ELECTROLYSIS; ELEMENTS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; IONS; LYSIS; MATERIALS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHOSPHORUS COMPOUNDS; REFRACTORY METALS; SURFACE COATING; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.