Published May 15, 2003 | Version v1
Journal article

Surface alloying of metals by nanosecond laser pulses under transparent overlays

  • 1. Moscow State University of Service, Cherkizovo, Glavnaya st., 99, Moscow Region, 141220 (Russian Federation)
  • 2. Ecole Nationale d'Ingenieurs de Saint-Etienne, 58, rue Jean Parot, 42023 Saint-Etienne Cedex 2 (France)
  • 3. Moscow State Engineering Physics Institute, Kashirskoe sh., 31, 115409, Moscow (Russian Federation)

Description

A thorough study was made of the processes determining the formation of metastable surface alloys in a film-substrate system [using Au(110 nm)-Ni and Sn(40 nm)-Cr systems as an example] irradiated by laser pulses of nanosecond duration. The irradiation was performed in conventional conditions (in air) and, following the applied method, through a transparent overlay. Scanning/transmission electron microscopy and Rutherford backscattering spectroscopy investigations of alloys were complemented by the measurements of acoustic signals initiated by laser pulses in the substrate. It has been ascertained that the alloy formation in air is accompanied by two competitive processes: laser sputtering of the film substance and its diffusion into the molten substrate layer. As the irradiation intensity goes up, the hydrodynamical sputtering mechanism is replaced by the atomic vaporization. As a result, sufficiently high vapor pressure (up to 102 bar) is generated above the film surface, the film is pressed to the substrate, and the heat and mass transport through the film-substrate interface is realized. However, no more than 20% of the atoms (of their total amount in the film) penetrate into the substrate, and the depth of alloying is within 100 nm. The experiments on the irradiation of the same systems through transparent overlays (water or ''liquid glass'') have demonstrated a marked change in the pattern of processes: alloying atoms efficiently penetrate from the film into the substrate, the depth of alloying increases to 400 nm, and defects are formed in deep layers of the substrate

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
93
Journal Issue
10
Journal Page Range
p. 5989-5999
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2003 American Institute of Physics.