Published 1992 | Version v1
Book

Experiments and analysis of wave propagation, absorption and backscattering in plasmas

  • 1. Univ. of Wisconsin, Madison, WI (United States). Electrical and Computer Engineering Dept.

Description

The authors present measurements and analysis of the absorption, reflection and scattering of electromagnetic waves due to electron cyclotron absorption zones and the presence of scatterers in a plasma. The 12 cm diameter by 2 m laboratory plasma is produced by a 2.45 GHz microwave source. The plasma density that can be reached is in the range of 5 x 109 cm-3 15 x 1011 cm-3 with electron temperatures in the 3--6 eV range and 0.5--1.5 kG magnetic fields. Wideband wave absorption of 30--50 dB due to the electron cyclotron resonance zone in the 1.5--3.0 GHz range is measured. They also measure the strong wave damping rate, ki, near cyclotron resonance and compare it with WKB predictions. Measurements using a modulated homodyne detection system are made that are sensitive to the backscatter from a movable probe in the plasma. This system measures a reduction in backscatter signal produced by an intervening cyclotron resonance zone between the transmitter and the encapsulated modulated scatterer. The phase sensitive system is used to measure the local k-spectrum in the inhomogeneous plasma and is compared with WKB theory. Experiments which examine the frequency sensitivity of launched ion acoustic modes from the modulated PIN diode dipole scatterer will also be presented. The authors also present studies of TMAE (tetrakis-dimethylamino-ethylene) gas plasma formation by ultraviolet photoionization. Both ultraviolet flashtube and 193 nm, 10 ns, 10 mJ excimer laser pulses are used to create plasmas from TMAE gas. The density and temperature of these transient plasmas is measured using Langmuir probe techniques. These basic studies are carried out to determine the best methods for plasma creation for subsequent microwave propagation and attenuation measurements through the plasma thus formed

Part of:
IEEE conference record--Abstracts

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (United States)
ISBN
0-7803-0716-X
Imprint Title
IEEE conference record--Abstracts
Imprint Pagination
200 p.
Journal Page Range
p. 98.

Conference

Title
19. Institute of Electrical and Electronic Engineers (IEEE) international conference on plasma science.
Dates
1-3 Jun 1992.
Place
Tampa, FL (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
25020496
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION; ELECTROMAGNETIC RADIATION; INHOMOGENEOUS PLASMA; MICROWAVE EQUIPMENT; PLASMA; PLASMA PRODUCTION; REFLECTION; SCATTERING
Descriptors DEC
ELECTRONIC EQUIPMENT; EQUIPMENT; RADIATIONS; SORPTION

Optional Information

Secondary number(s)
CONF-920638--.