Published August 2015 | Version v1
Journal article Metadata-only

Maximal charge injection of consecutive electron pulses with uniform temporal pulse separation

Creators

  • 1. Engineering Product Development, Singapore University of Technology and Design, Singapore 487372 (Singapore)
  • 2. Department of Physics, National Central University, Jhongli 32001, Taiwan (China)
  • 3. Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109-2104 (United States)

Description

A charge sheet model is proposed for the study of the space-charge limited density of consecutive electron pulses injected to in a diode with uniform temporal pulse separation. Based on the model, an analytical formula is derived for expressing the dependency of the charge density limit on the gap spacing, gap voltage, and pulse separation. The theoretical results are verified by numerical solutions up to electron energy of a few MeV, including relativistic effects. The model can be applied to the design of multiple-pulse electron beams for time resolved electron microscopy and free electron lasers

Additional details

Identifiers

DOI
10.1063/1.4928586;

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
22
Journal Issue
8
Journal Page Range
p. 084504-084504.5
ISSN
1070-664X
CODEN
PHPAEN

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47060175
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CHARGE DENSITY; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON MICROSCOPY; ELECTRONS; FREE ELECTRON LASERS; MEV RANGE; NUMERICAL SOLUTION; PULSES; RELATIVISTIC RANGE; SPACE CHARGE; TIME RESOLUTION
Descriptors DEC
BEAMS; ELEMENTARY PARTICLES; ENERGY RANGE; FERMIONS; LASERS; LEPTON BEAMS; LEPTONS; MATHEMATICAL SOLUTIONS; MICROSCOPY; PARTICLE BEAMS; RESOLUTION; TIMING PROPERTIES

Optional Information

Notes
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