Published August 1996 | Version v1
Journal article

Effects of radiation-induced oxide and interface charges on mobility degradation in MOSFETs

  • 1. Xinjiang Inst. of Physics, the Chinese Academy of Sciences, Urumqi (China)

Description

The model separating the effects of radiation-induced oxide-trapped charge and interface state charge on mobility can well manifest the mechanisms of the radiation induced mobility degradation in NMOSFET and PMOSFET. The comparison between the model and the experiment shows that the Coulomb scattering role of interface defects to hole is larger than to electrons

Additional details

Publishing Information

Journal Title
Nuclear Science and Techniques
Journal Volume
7
Journal Issue
3
Journal Page Range
p. 183-186.
ISSN
1001-8042
CODEN
NSETEC