Published March 2007 | Version v1
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Multilayer mirrors for use in the energy range of 1-8 keV

  • 1. Japan Atomic Energy Agency, Quantum Beam Science Directorate, Kizu, Kyoto (Japan)
  • 2. Shimadzu Emit Co., Ltd., Osaka (Japan)
  • 3. Center for X-Ray Optics, Lawrence Berkeley National Lab., Berkeley, CA (United States)

Description

We have fabricated and evaluated the multilayer mirrors for use in the energy range of 1-8 keV. As a result of theoretical investigation, we have found that Co/Si and Co/SiO2 multilayers show relatively high reflectivity. We have fabricated the Co/Si and Co/SiO2 multilayers by means of an ion beam sputtering method, and evaluated the layer structures and optical properties of the fabricated multilayers. A simulation calculation for the Co/Si multilayer implies large inter diffusion layers. The inter diffusion layers cause the degradation of optical contrasts of the layer boundaries, so that the reflectivity of Co/Si multilayer decrease. Roughnesses of the Co/SiO2 multilayer are larger than those of the Co/Si multilayer, but it is possible that x-ray reflectivity can be increased by using SiO2 instead of Si. (author)

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Part of:
Proceedings of the joint meeting of ultrafast pulse high intensity laser research collaboration and JAEA-KPSI 7th symposium on advanced photon research

Additional details

Publishing Information

Imprint Title
Proceedings of the joint meeting of ultrafast pulse high intensity laser research collaboration and JAEA-KPSI 7th symposium on advanced photon research
Imprint Pagination
259 p.
Journal Page Range
p. 225-228
Report number
JAEA-Conf--2007-001

Conference

Title
Joint meeting of ultrafast pulse high intensity laser research collaboration; 7. JAEA-KPSI symposium on advanced photon research
Dates
10-12 May 2006
Place
Kizu, Kyoto (Japan)

Optional Information

Notes
10 refs., 3 figs.