Published April 27, 1992
| Version v1
Journal article
Liquid-vapor density profile of helium: An x-ray study
Creators
- 1. Department of Physics, Brookhaven National Laboratory, Upton, New York 11973-5000 (United States)
- 2. Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)
- 3. Department of Physics, Harvard University, Cambridge, Massachusetts 02138 (United States)
Description
The average liquid-vapor density profiles left-angle ρ(z)right-angle of thick 4He films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2±1 A at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6+1,-2 A. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed
Additional details
Publishing Information
- Journal Title
- Physical Review Letters
- Journal Volume
- 68
- Journal Issue
- 17
- Series
- Phys. Rev. Lett.
- Journal Page Range
- 2628-2631
- ISSN
- 0031-9007
- CODEN
- PRLTA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 23085305
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION; DENSITY; HELIUM II; INTERFACES; MEASURING METHODS; REFLECTIVITY; SURFACE PROPERTIES; SYNCHROTRON RADIATION SOURCES
- Descriptors DEC
- EVEN-EVEN NUCLEI; FLUIDS; HELIUM ISOTOPES; HELIUM 4; ISOTOPES; LIGHT NUCLEI; NUCLEI; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; QUANTUM FLUIDS; RADIATION SOURCES; SORPTION; STABLE ISOTOPES