Published November 2015 | Version v1
Journal article

Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices

  • 1. Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing 100871 (China)

Description

The effects of the physical damages induced by heavy ion irradiation on the performance of partially-depleted SOI devices are experimentally investigated. After heavy ion exposure, different degradation phenomena are observed due to the random strike of heavy ions. A decrease of the saturation current and transconductance, and an enhanced gate-induced drain leakage current are observed, which are mainly attributed to the displacement damages that may be located in the channel, the depletion region of the drain/body junction or the gate-to-drain overlap region. Further, PDSOI devices with and without body contact are compared, which reveals the differences in the threshold voltage shift, the drain-induced barrier lowing effect, the transconductance and the kink effect. The results may provide a guideline for radiation hardened design. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/36/11/114004

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
36
Journal Issue
11
Journal Page Range
[5 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47075779
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
COMPARATIVE EVALUATIONS; DESIGN; ELECTRIC POTENTIAL; HEAVY IONS; IRRADIATION; LEAKAGE CURRENT
Descriptors DEC
CHARGED PARTICLES; CURRENTS; ELECTRIC CURRENTS; EVALUATION; IONS