Digital pulse shape analysis for charged particle identification with a nTD silicon detector and 1 GHz sampling digitizer

As a result, the pulse shape depends on the charge, mass and energy of the incident ion. If the particles are injected from the rear side, where the electric field is low, the heavier ions will be stopped nearer to the entrance creating denser plasma there as compared to the lighter ions. As a result both the plasma erosion time and the drift time will be larger for heavier ions as compared to the lighter ions. Thus the rear side injection make the PSA technique more sensitive. However, particle identification using PSA required highly uniform resistivity Si crystal and fast pulse processing. Earlier we have reported PI for ^6,7Li using PSA technique with a nTD Si detector and a indigenously developed FPGA based digitizer. In the present experiment we have extended the measurement for heavier ions