Published July 1993 | Version v1
Journal article

Ion-source plasma

  • 1. Kyoto Univ. (Japan). Dept. of Electronics

Description

The properties of ion-source plasma are determined from requirements of high quality and quantity ion beam extraction: the plasma density ranges between 5 x 109 and 5 x 1012 cm-3, the ion temperature should be within several eV, and the uniformity of plasma density within several %. In order to obtain such high density plasma, firstly, ionizing electrons should be effectively confined by crossed electric and magnetic fields or cusp magnetic fields. Secondly, ion recombination on the plasma production chamber wall should be lowered. The methods for production of ionizing electrons and for supply of materials to be ionized are also important. (author)

Additional details

Additional titles

Augmented title (English)
Plasma production in practical devices

Publishing Information

Journal Title
Purazuma, Kaku Yugo Gakkai-Shi
Journal Volume
69
Journal Issue
7
Journal Page Range
p. 765-768.
ISSN
0918-7928
CODEN
PKYGE5

INIS