Published March 31, 2003 | Version v1
Journal article

Pseudo-non-contact mode: why it can give true atomic resolution

Creators

Description

Pseudo-non-contact (PNC) mode of scanning in atomic force microscopy (AFM) is a modification of the contact mode while the AFM tip and sample are immersed in a rather diluted aqueous surfactant solution. An additional repulsion due to the presence of surfactant leads to a decrease of the tip-sample interaction, mostly friction, during scanning. Experiments have shown considerable improvement in the resolution over a regular contact scanning. In this paper, further theoretical evidence is suggested that the PNC mode is capable of reaching the true atomic resolution, i.e., imaging of atomic defects. Forces acting between the AFM tip and sample under surfactant solution were measured. These data were used to simulate behavior of the AFM tip while scanning in the vicinity of an atomic defect, vacancy. It is shown that the scan force needed to remove the topmost atom is considerably higher in the presence of surfactant. Consequently, a regular force of a few nano-Newtons can be used in imaging with true atomic resolution

Additional details

Identifiers

DOI
10.1016/S0169-4332(02)01476-9;
arXiv
arXiv:hep-ex/0111060v3;
PII
S0169433202014769;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
210
Journal Issue
1-2
Journal Page Range
p. 37-42
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
5. international conference on noncontact atomic force microscopy (AFM)
Acronym
NC-AFM 2002
Dates
11-14 Aug 2002
Place
Montreal (Canada)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38086459
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ATOMIC FORCE MICROSCOPY; INTERACTIONS; RESOLUTION; SPECTROSCOPY; SURFACTANTS; VACANCIES
Descriptors DEC
CRYSTAL DEFECTS; CRYSTAL STRUCTURE; MICROSCOPY; POINT DEFECTS

Optional Information

Copyright
Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.