Published February 1991 | Version v1
Journal article

Thin metal oxide films on Si: possible diffusion barrier for Bi-Sr-Ca-Cu-O

  • 1. Simon Fraser Univ., Burnaby, BC (Canada)

Description

We present some of the results of a search for a diffusion barrier on silicon suitable for high Tc superconducting films. We demonstrate that thin (∝50 A) layers of Ca or Sr oxides inhibit the interdiffusion of Si and subsequent Cu layers. We present results for films made by e-beam coevaporation at a substrate temperature of 400 C. (orig.)

Additional details

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
169
Journal Issue
pt.3
Series
Phys., B Condens. Matter.
Journal Page Range
673-674
ISSN
0921-4526
CODEN
PHYBE

Conference

Title
19. international conference on low temperature physics (LT-19).
Dates
16-22 Aug 1990.
Place
Brighton (UK).