Published October 1, 2006
| Version v1
Journal article
Perpendicular anisotropy in electrodeposited Au/Co films
Creators
- 1. Instituto de Fisica, UFRGS, 91501-970 Porto Alegre, RS (Brazil) and LPMC - CNRS UMR 7643, Ecole Polytechnique, 91128 Palaiseau (France)
- 2. LPMC - CNRS UMR 7643, Ecole Polytechnique, 91128 Palaiseau (France)
- 3. Instituto de Fisica, UFRGS, 91501-970 Porto Alegre, RS (Brazil)
Description
In the present work, we studied the magnetic and structural properties of Co ultrathin films grown by electrodeposition onto Au substrates. The influence of the solution pH is particularly investigated using in situ and ex situ magnetization measurements. The results indicated that the magnetization is out of plane for both basic and acid solutions. Deposits performed at pH 8.5 keep their perpendicular component up to thickness of 20 monolayers (ML) either in or out of the solution, whereas the magnetization becomes in plane for a much lower thickness for deposits performed at pH 3.5 (above 2 ML in solution and 6-7 ML after capping with Cu)
Additional details
Identifiers
- DOI
- 10.1016/j.physb.2006.05.174;
- PII
- S0921-4526(06)01056-8;
Publishing Information
- Journal Title
- Physica. B, Condensed Matter
- Journal Volume
- 384
- Journal Issue
- 1-2
- Journal Page Range
- p. 138-140
- ISSN
- 0921-4526
- CODEN
- PHYBE3
Conference
- Title
- 7. Latin American workshop on magnetism, magnetic materials and their applications
- Acronym
- LAW3M-05
- Dates
- 12-16 Dec 2005
- Place
- Renaca (Chile)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38070758
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANISOTROPY; COBALT; ELECTRODEPOSITION; GOLD; INTERFACES; MAGNETIZATION; PH VALUE; SUBSTRATES; THICKNESS; THIN FILMS
- Descriptors DEC
- DEPOSITION; DIMENSIONS; ELECTROLYSIS; ELEMENTS; FILMS; LYSIS; METALS; SURFACE COATING; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.