Published January 2013
| Version v1
Journal article
Trial-produce and performance research of fast diode by using high-energy electron irradiation technology
- 1. Physics School of Nanjing University (China)
- 2. Wuxi EL Pont Group (China)
Description
This paper reported the new technology on controlling the minority carrier life time of fast diode by using high energy 12 MeV electronic radiation, discussed the influence of high-energy electron irradiation to the device's reverse recovery time trr and positive peak pressure drop VFM, and studied the nature of the defects' energy level. Application results show that the defect level introduced by irradiation directly cause the VFM and trr'S change, this technology can successfully replace the traditional technique of gold doped process, and have a lot of advantages such as high control precision, high consistency of trr and VFM, repeatability, high percent of pass and simple process, so this technology has promising future. (authors)
Additional details
Publishing Information
- Journal Title
- Nuclear Techniques
- Journal Volume
- 36
- Journal Issue
- 1
- Journal Page Range
- [5 p.]
- ISSN
- 0253-3219
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 47057317
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- DEFECTS; ELECTRONS; EQUIPMENT; IRRADIATION; MEV RANGE 10-100; PEAKS; PERFORMANCE; PRESSURE DROP; SEMICONDUCTOR DIODES; TIME DEPENDENCE
- Descriptors DEC
- ELEMENTARY PARTICLES; ENERGY RANGE; FERMIONS; LEPTONS; MEV RANGE; SEMICONDUCTOR DEVICES
Optional Information
- Notes
- 5 figs., 2 tabs., 10 refs., 010401-1-010401-5