Published February 1, 2011 | Version v1
Journal article

The research on mechanical effect etching Si in pulsed laser micromaching under water

  • 1. School of Mechanical and Electrical Engineering, Guilin University of Electronic Technology, Guilin, 541004 (China)
  • 2. School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074 (China)

Description

To explore further the influencing of mechanical effects on laser machining in the liquid, in the process of great-energy and short-pulsed laser irradiating matter in the liquid, the experiments of 248 nm laser etching n-Si under water were carried out. The removal mechanism of brittle material etched by mechanical effects, which is induced during high-energy and short-pulsed laser machining in the liquid, was discussed. In the paper, the approximate mechanics model of indentation fracture was used to analyze the mechanical effects for removing brittle materials of silicon when laser machining in the liquid. Based on this, a theoretical model of material removal rate was proposed; the experiment of laser machining under water was adopted to validate the model. The experimental results indicate that the removal rate of brittle material caused by shock forces is relatively great.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2010.11.105

Additional details

Identifiers

DOI
10.1016/j.apsusc.2010.11.105;
PII
S0169-4332(10)01628-4;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
257
Journal Issue
8
Journal Page Range
p. 3677-3681
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44024900
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
APPROXIMATIONS; ETCHING; LASER BEAM MACHINING; LIQUIDS; MATTER; SILICON; UNDERWATER; WATER
Descriptors DEC
CALCULATION METHODS; ELEMENTS; FLUIDS; HYDROGEN COMPOUNDS; LEVELS; MACHINING; OXYGEN COMPOUNDS; SEMIMETALS; SURFACE FINISHING

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.