Published July 13, 1993 | Version v1
Patent

Suppression method for volatization of ruthenium and technetium

Description

In a process for condensating radioactive liquid wastes, volatile ruthenium and technetium are brought into contact with a silicon resin or quartz to decompose the ruthenium and technetium into nonvolatile chemical composition and suppress their volatilization. This can improve a radiation confining rate and reduce the amount of radiation released to circumstance without increasing the amount of secondary radioactive wastes. (T.M.)

Availability note (English)

Available from JAPIO. Also available from EPO.

Additional details

Publishing Information

Imprint Pagination
3 p.
IPC:
Int. Cl. G21F9/06.
IPC
Int. Cl. G21F9/06.
Patent number
JP patent document 5-172993/A/

Optional Information

Secondary number(s)
JP patent application 3-344384.