Published February 2018 | Version v1
Journal article Metadata-only

Synthesis of graphene via ultra-sonic exfoliation of graphite oxide and its electrochemical characterization

Creators

  • 1. School of Engineering and Technology, Central Michigan University, Mt. Pleasant, MI 48859 (United States)
  • 2. Department of Materials Engineering, University of British Columbia, Vancouver, BC V6T 1Z4 (Canada)
  • 3. Science of Advanced Materials, Central Michigan University, Mt. Pleasant, MI 48859 (United States)

Description

Highlights: • A relatively direct synthesis method for production of graphene is presented. • IR, Raman and XRD analyses confirmed formation of graphene starting from graphite. • XPS and TEM characterization validated the formation of graphene. • Electrochemical response of GO and graphene was evaluated in de-aerated 0.5M KOH. • Presence of functional groups in GO resulted in improved values of Rct and Ceff,p.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2017.11.062

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2017.11.062;
PII
S0254058417309410;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
206
Journal Page Range
p. 7-11
ISSN
0254-0584
CODEN
MCHPDR

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
49096545
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ELECTROCHEMISTRY; GRAPHENE; GRAPHITE; OXIDES; POTASSIUM HYDROXIDES; SYNTHESIS; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY; ZINC SELENIDES
Descriptors DEC
ALKALI METAL COMPOUNDS; CARBON; CHALCOGENIDES; CHEMISTRY; COHERENT SCATTERING; DIFFRACTION; ELECTRON SPECTROSCOPY; ELEMENTS; HYDROGEN COMPOUNDS; HYDROXIDES; MINERALS; NONMETALS; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; POTASSIUM COMPOUNDS; SCATTERING; SELENIDES; SELENIUM COMPOUNDS; SPECTROSCOPY; ZINC COMPOUNDS

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.