Published September 15, 2010 | Version v1
Journal article

Influence of neodymium concentration on excitation and emission properties of Nd doped gallium oxide nanocrystalline films

  • 1. Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw (Poland)
  • 2. CIMAP, CEA/UMR CNRS 6252/ENSICAEN, Universite de Caen Basse Normandie, 6 Boulevard Marechal Juin, 14050 Caen (France)

Description

Gallium oxide and more particularly β-Ga2O3 matrix is an excellent material for new generation of devices electrically or optically driven as it is known as the widest band gap transparent conductive oxide. In this paper, the optical properties of neodymium doped gallium oxide films grown by magnetron sputtering have been analyzed. The influence of the Nd ions concentration on the excitation/emission mechanisms of Nd ions and the role of gallium oxide matrix have been investigated. The grain size reduction into gallium oxide films have been observed when concentration of Nd increases. It has been found for all samples that the charge transfer is the main excitation mechanism for Nd ions where defect states play an important role as intermediate states. As a consequence Nd emission efficiency increases with temperature giving rise to most intensive emission at 1087 nm at room temperature.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
108
Journal Issue
6
Journal Page Range
p. 063535-063535.6
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2010 American Institute of Physics