Vapor phase epitaxy of antimonene-like nanocrystals on germanium by an MOCVD process
Creators
- 1. CNR-IMM, Unit of Agrate Brianza, Via C. Olivetti 2, 20864 Agrate Brianza (MB) (Italy)
- 2. CNR-IMEM, Parco Area delle Scienze, 37/a, 43124 Parma (Italy)
Description
Highlights: • β-phase allotrope of Sb is synthetized by a new method based on MOCVD. • Thin Sb epitaxial nanocrystals are grown on Ge substrates by a Au-catalysed process. • Raman measurements and simulations indicate antimonene-like properties. • The new method can pave the way to large-area antimonene layers for novel devices. Synthetic two-dimensional (2D) mono-elemental crystals, namely X-enes, have recently emerged as a new frontier for atomically thin nanomaterials with on-demand properties. Among X-enes, antimonene, the β-phase allotrope of antimony, is formed by atoms arranged in buckled hexagonal rings bearing a comparatively higher environmental stability with respect to other players of this kind. However, the exploitation of monolayer or few-layer antimonene and other 2D materials in novel opto-electronic devices is still hurdled by the lack of scalable processes. Here, we demonstrated the viability of a bottom-up process for the epitaxial growth of antimonene-like nanocrystals (ANCs), based on a Metal-Organic Chemical Vapor Deposition (MOCVD) process, assisted by gold nanoparticles (Au NPs) on commensurate (1 1 1)-terminated Ge surfaces. The growth mechanism was investigated by large- and local-area microstructural analysis, revealing that the etching of germanium, catalyzed by the Au NPs, led to the ANCs growth on the exposed Ge (1 1 1) planes. As a supportive picture, ab-initio calculations rationalized this epitaxial relationship in terms of compressively strained β-phase ANCs. Our process could pave the way to the realization of large-area antimonene layers by a deposition process compatible with the current semiconductor manufacturing technology.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2020.147729Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2020.147729;
- PII
- S0169433220324867;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 535
- Journal Page Range
- vp.
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54078528
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; ELECTRONIC EQUIPMENT; GERMANIUM; NANOCRYSTALS; NANOPARTICLES; ORGANOMETALLIC COMPOUNDS; SEMICONDUCTOR MATERIALS; VAPOR PHASE EPITAXY
- Descriptors DEC
- CHEMICAL COATING; CRYSTAL GROWTH METHODS; CRYSTALS; DEPOSITION; ELEMENTS; EPITAXY; EQUIPMENT; MATERIALS; METALS; NANOSTRUCTURES; ORGANIC COMPOUNDS; PARTICLES; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2020 Elsevier B.V. All rights reserved.