Pulsed laser deposition and characterization of textured Pd-doped-SnO2 thin films for gas sensing applications
Creators
- 1. LP3, CNRS/Universite de la Mediterranee, Pole scientifique de Luminy, 163 avenue de Luminy, C.917, 13288 Marseille cedex 9 (France)
- 2. University of Lecce, Physics Department, via Arnesano, 73100 Lecce (Italy)
- 3. University of Lecce, Physics Department and National Nanotechnology Laboratory of Istituto Nazionale di Fisica della Materia (INFM), 73100 Lecce (Italy)
- 4. University of Bucharest, Faculty of Physics, PO Box MG-11, Bucharest-Magurele (Romania)
- 5. University of Northumbria, Advanced Materials Research Institute, Newcastle (United Kingdom)
Description
Pd-doped-SnO2 thin films were grown on Si (100) substrates using pulsed laser deposition at room temperature. Scanning electron microscopy and atomic force microscopy studies showed that the film morphologies are strongly related to two major parameters: first, high O2 background pressure, namely ≥ 10 Pa, induces the formation of nanoparticles by condensation in the gas phase; second, when the target-substrate distance d t-s is close to the plume length L p, considering an adiabatic expansion, textured thin films are obtained. Their morphologies depend therefore on the O2 pressure, since by increasing the pressure from 10 to 100 Pa the film morphology changes from a cracked structure to a well developed cauliflower-like-structure with a columnar growth. X-ray photoelectron spectroscopy, energy dispersive X-ray and grazing incidence X-ray diffraction were also employed to analyze, respectively, the chemical bonding state, the chemical composition and the structure in the deposited films. Sub-stoichiometric thin films are also synthesized with a Pd content of about 2.3 at.% under O2 background pressures higher than 10 Pa
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2005.10.063;
- PII
- S0040-6090(05)02038-9;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 497
- Journal Issue
- 1-2
- Journal Page Range
- p. 142-148
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37112363
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL COMPOSITION; DOPED MATERIALS; ENERGY BEAM DEPOSITION; LASER RADIATION; LASERS; LEAD; NANOSTRUCTURES; PULSED IRRADIATION; SCANNING ELECTRON MICROSCOPY; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIN OXIDES; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; IRRADIATION; MATERIALS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SCATTERING; SPECTROSCOPY; SURFACE COATING; TEMPERATURE RANGE; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.