Electro-optic thin films by magnetron sputtering

The paper provides a progress report of a continuing collaboration between the Kurt J. Lesker Company, and Carnegie Mellon University. They are developing and transferring an important manufacturing technology from an academic to an industrial environment and are using magnetron sputtering as a reliable technique for the deposition of epitaxial, high-quality electro-optics layers and light-emitting devices. Results are presented for LiNbO3 and Si3N4