Published June 15, 2014 | Version v1
Journal article

AFM image artifacts

Description

Atomic force microscopy (AFM) has become an important tool in surface science and nanotechnology. It is obvious that the intrinsic limitations of AFM must be understood in order to get useful information about surface structure of the material under study. The ability to recognize artifacts should assist in reliable evaluation of instrument operation and in reporting of data. In this paper, we discuss the most frequently encountered image artifacts in atomic force microscopy. A variety of artifacts are illustrated by the results obtained with the aid of contact AFM (C-AFM), which can help avoid misinterpretations. It is shown that, despite inaccuracies in AFM image generation, in many cases valuable information can be obtained.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2014.01.149

Additional details

Identifiers

DOI
10.1016/j.apsusc.2014.01.149;
PII
S0169-4332(14)00201-3;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
304
Journal Page Range
p. 11-19
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
6. international workshop on surface physics 'functional materials'
Acronym
IWSP 2013
Dates
1-6 Sep 2013
Place
Niemcza (Poland)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46023096
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ATOMIC FORCE MICROSCOPY; EVALUATION; IMAGES; NANOTECHNOLOGY; SURFACES
Descriptors DEC
MICROSCOPY

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.