Innovative techniques for the microstructural optical characterization of thin films

Thin and ultra-thin films (from few μm to few nm) are omnipresent in our environment (alteration layers, protective coatings, conductive or insulating films, membranes, sensors etc). Their properties depend both on their chemical composition and microstructure. The optimization of these properties requires a thin characterization of the microstructure. This book presents different characterization techniques based on the interaction between an electromagnetic or neutron beam and matter. It explains the theoretical bases and the recent advances of ellipsometry, reflectometry (X-ray, neutronic and optical) and X-ray diffraction techniques. The different chapters are written by specialists who propose synthetic texts with bibliographic references. Content: 1 - basic principles of ellipsometry; 2 - infrared ellipsometry applied to thin films; 3 - heterogeneities and porosity analysis by coupled ellipsometry/gas adsorption technique; 4 - basic principles of X-ray reflectometry and application to porosity analysis; 5 - neutrons reflectivity; 6 - basics of scanning angle reflectometry and application for nano-particulate films; 7 - X-ray diffraction on thin films. (J.S.)