Published November 24, 2008
| Version v1
Journal article
Narrow-band deep-ultraviolet light emitting device using Al1-xGdxN
Creators
- 1. Department of Electrical and Electronics Engineering, Graduate School of Engineering, Kobe University, Rokkodai 1-1, Nada, Kobe 657-8501 (Japan)
- 2. YUMEX INC., Itoda 400, Yumesaki, Himeji, Hyogo, 671-2114 (Japan)
Description
We demonstrated mercury-free narrow-band deep-ultraviolet luminescence from field-emission devices with Al1-xGdxN thin films. The Al1-xGdxN thin films were grown on fused silica substrates by a radio frequency reactive magnetron sputtering method. The deposited film shows a strong c-axis preferential orientation. A resolution limited, narrow intra-4f luminescence line from Gd3+ ions has been observed at 315 nm. The luminescence spectrum depends on the growth temperature of the thin film, and the intensity varies as a function of the GdN mole fraction
Additional details
Identifiers
- DOI
- 10.1063/1.3028341;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 93
- Journal Issue
- 21
- Journal Page Range
- p. 211901-211901.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40051148
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM COMPOUNDS; CRYSTAL GROWTH; DEPOSITION; FIELD EMISSION; GADOLINIUM IONS; GADOLINIUM NITRIDES; GRAIN ORIENTATION; LIGHT EMITTING DIODES; PHOTOLUMINESCENCE; RESOLUTION; SEMICONDUCTOR MATERIALS; SILICA; SPUTTERING; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION
- Descriptors DEC
- CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; EMISSION; FILMS; GADOLINIUM COMPOUNDS; IONS; LUMINESCENCE; MATERIALS; MICROSTRUCTURE; MINERALS; NITRIDES; NITROGEN COMPOUNDS; ORIENTATION; OXIDE MINERALS; PHOTON EMISSION; PNICTIDES; RADIATIONS; RARE EARTH COMPOUNDS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES
Optional Information
- Notes
- (c) 2008 American Institute of Physics