Published October 25, 2006 | Version v1
Journal article

Microstructural and corrosivity changes induced by nitrogen ion implantation on chromium films

  • 1. Plasma Physics Research Center, Science and Research Campus of Islamic Azad University, P.O.Box 14665-678, Tehran (Iran, Islamic Republic of)
  • 2. Nuclear research center for Agriculture and Medicine, Atomic Energy organization of Iran, P.O.Box:31585-498, Karj (Iran, Islamic Republic of)
  • 3. Department of Physics University of Tehran, North-Kargar St, Tehran (Iran, Islamic Republic of)

Description

The chromium thin films were prepared using ion beam deposition on stainless steel 304. The chromium films were implanted by nitrogen ions after deposition at doses in the range of 4.5 x 1017 to 2.7 x 1018 N+/cm2 and energy of 30 keV. The formation of nitride phases and corrosion behavior after nitrogen implantation were characterized by XRD and corrosion test, respectively. The results show that corrosion resistance rise, reach to a maximum at dose of 1.8 x 1018, and then fall down at higher doses. In addition, the effect of corrosion tests was analyzed using scanning electron microscopy (SEM)

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.12.171;
PII
S0040-6090(05)02499-5;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
2
Journal Page Range
p. 571-575
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
8. international conference on atomically controlled surfaces, interfaces and nanostructures; ICTF-13: 13. international congress on thin films
Acronym
ACSIN-8
Dates
20-23 Jun 2005
Place
Stockholm (Sweden)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.