Published August 1, 2016 | Version v1
Journal article Metadata-only

E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating

Creators

  • 1. Samara State Aerospace University, Moskovskoye Shosse 34, Samara, 443086 (Russian Federation)

Description

The main idea of this work was to determine the optimized parameters of E-beam lithography to obtain metal grating over dielectric thin film. This combination of metal/dielectric can provide high transmission spectrum of RGB colors. Different electric flux densities were used during E-beam writing and the best resolution and symmetric periodicity was obtained at 53 μC/cm2 dose. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/741/1/012150

Additional details

Identifiers

DOI
10.1088/1742-6596/741/1/012150;

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
741
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1742-6596

Conference

Title
3. international school and conference on optoelectronics, photonics, engineering and nanostructures
Acronym
Saint Petersburg OPEN 2016
Dates
28-30 Mar 2016
Place
St Petersburg (Russian Federation)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
49007751
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION SPECTROSCOPY; COLOR; DIELECTRIC MATERIALS; ELECTRON BEAMS; FABRICATION; FILTERS; FLUX DENSITY; GRATINGS; METALS; PERIODICITY; RESOLUTION; SYMMETRY; THIN FILMS
Descriptors DEC
BEAMS; ELEMENTS; FILMS; LEPTON BEAMS; MATERIALS; OPTICAL PROPERTIES; ORGANOLEPTIC PROPERTIES; PARTICLE BEAMS; PHYSICAL PROPERTIES; SPECTROSCOPY; VARIATIONS