Thin low Z coatings for plasma devices

Coating the walls of the vacuum chamber with beryllium or some other low Z material has been proposed as a possible means of solving the problems of high Z influx into plasmas. We attempt to demonstrate that very thin, low Z coatings are compatible with the operation of plasma devices and beneficial to plasma performance. We determine that the thickness of coating material required is only about 10 monolayers. In a radiation environment, radiation-induced solute segregation should help to maintain the integrity of such thin coatings against diffusion and other processes. We discuss the properties of these thin coatings and possible means of in situ application and maintenance. Since deposition of plasma impurities on the walls will occur anyway, we discuss injection of solid pellets into the plasma as a direct way of introducing impurities which would ultimately serve as coating material