A sol-gel approach to nanophasic copper oxide thin films
Description
Nanostructured copper oxide films were prepared via sol-gel starting from ethanolic solutions of copper (II) acetate [Cu(CH3COO)2·H2O]. Films were obtained by dip-coating at room temperature in air and were subsequently heat-treated at different temperatures (100-900 deg. C) in oxidizing (air), inert (N2) or reducing (4% H2 in N2) atmospheres. The evolution of the oxide coatings under thermal treatment was studied by glancing incidence X-ray diffraction, X-ray photoelectron spectroscopy and X-ray excited Auger electron spectroscopy. Different crystalline phases were observed as a function of the annealing conditions. Depending on both temperature and atmosphere, the film composition resulted single- or multi-phasic. All the layers were nanostructured with an average crystallite size lower than 20 nm. The most relevant results concerning sample composition and microstructure as well as their mutual relations with the synthesis conditions are presented and discussed
Additional details
Identifiers
- DOI
- 10.1016/S0040-6090;
- PII
- S0040609003009404;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 442
- Journal Issue
- 1-2
- Journal Page Range
- p. 48-52
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 4. international conference on coatings on glass
- Dates
- 3-7 Nov 2002
- Place
- Braunschweig (Germany)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37013597
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ACETATES; ANNEALING; AUGER ELECTRON SPECTROSCOPY; COATINGS; COPPER; COPPER OXIDES; DIP COATING; LAYERS; MICROSTRUCTURE; NANOSTRUCTURES; SOL-GEL PROCESS; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X RADIATION; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CARBOXYLIC ACID SALTS; CHALCOGENIDES; COHERENT SCATTERING; COPPER COMPOUNDS; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; HEAT TREATMENTS; IONIZING RADIATIONS; METALS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SCATTERING; SPECTROSCOPY; SURFACE COATING; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.