Published April 1993 | Version v1
Journal article Metadata-only

The use of PIXE and STIM in microelectronics analysis

Creators

  • 1. Nuclear Physics Lab., Oxford Univ. (United Kingdom)

Description

The use of scanning PIXE in conjunction with scanning transmission ion microscopy (STIM) and Rutherford backscattering spectrometry (RBS) represents a powerful combination of imaging and analytical techniques for microelectronics analysis. Nuclear microprobe results from four different devices are presented here which show the applications and advantages of PIXE and STIM in microelectronics analysis. (orig.)

Additional details

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B
Journal Volume
75
Journal Issue
1-4
Journal Page Range
p. 341-346.
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
6. international conference on particle induced X-ray emission (PIXE) and its analytical applications.
Dates
20-24 Jul 1992.
Place
Tokyo (Japan).

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
24048977
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S42: ENGINEERING;
Resource subtype / Literary indicator
Conference, Numerical Data
Descriptors DEI
BEAM SCANNERS; ENERGY LOSSES; EXPERIMENTAL DATA; ION MICROSCOPY; MEV RANGE 01-10; MICROANALYSIS; MICROELECTRONICS; PIXE ANALYSIS; PROTON BEAMS; SPATIAL DISTRIBUTION; TRANSISTORS
Descriptors DEC
BEAM MONITORS; BEAMS; CHEMICAL ANALYSIS; DATA; DISTRIBUTION; ENERGY RANGE; INFORMATION; MEASURING INSTRUMENTS; MEV RANGE; MICROSCOPY; MONITORS; NONDESTRUCTIVE ANALYSIS; NUCLEON BEAMS; NUMERICAL DATA; PARTICLE BEAMS; SEMICONDUCTOR DEVICES; X-RAY EMISSION ANALYSIS