Charge collection measurements on slim-edge microstrip detectors
Creators
- 1. INFN Firenze and Università di Firenze, Dipartimento di Energetica, Via S. Marta 3, 50139 Firenze (Italy)
- 2. Liceo Scientifico Severi, Via Alcuino 4, Milano (Italy)
- 3. US Naval Research Laboratory, Code 7651, 4555 Overlook Ave., SW, Washington DC, 20375 (United States)
- 4. SCIPP, UC Santa Cruz, Santa Cruz, CA 95064 (United States)
Description
We have generated slim edges on manufactured silicon strip detectors by cleaving the non-active edge material and passivating the very smooth edge with a thin coat of silicon oxide. We report a comparison of I-V measurements and charge collection and noise measurements on two identical sensors, one with and one without slim edge treatment. The current voltage measurements of the entire sensor and individual strips indicate that the large current increase due to the treatment is confined to the guard ring, while the strips show essentially no increase in leakage currents. The noise on all strips, including the one adjacent to the slim edge, is not changed by the cut. The signal from a beta source before and after cutting is the same within 4%.
Availability note (English)
Available from http://dx.doi.org/10.1088/1748-0221/7/05/P05002Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Instrumentation
- Journal Volume
- 7
- Journal Issue
- 05
- Journal Page Range
- p. P05002
- ISSN
- 1748-0221
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44051235
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- BETA SOURCES; CHARGE COLLECTION; LEAKAGE CURRENT; RINGS; SECURITY PERSONNEL; SENSORS; SI SEMICONDUCTOR DETECTORS; SILICON; SILICON OXIDES
- Descriptors DEC
- CHALCOGENIDES; CURRENTS; ELECTRIC CURRENTS; ELEMENTS; MEASURING INSTRUMENTS; OXIDES; OXYGEN COMPOUNDS; PARTICLE SOURCES; PERSONNEL; RADIATION DETECTORS; RADIATION SOURCES; SEMICONDUCTOR DETECTORS; SEMIMETALS; SILICON COMPOUNDS